A new ultraviolet laser source pushes maskless lithography closer to mainstream use in advanced semiconductor packaging by ...

Japanese firm Nuvoton Technology has started mass production of its high-power UV semiconductor laser (379 nm, 1.0 W), which ...

Using an opto-mechanical architecture with a master-oscillator regenerative-ring amplifier, the 193-nm LithoTEX excimer laser for lithography scanning delivers a power output of 50 W with a pulse ...

Nano-3D printing market leader Nanoscribe has opened its Shanghai Quantum X demolab, bringing next-generation 3D ...

Design of the laser speckle exposure system. Schematic representation of the laser speckle exposure system, comprising the UV laser, shutter, beam expander, mirror, convex lens, engineering diffuser, ...

Nuvoton Technology Corporation Japan (hereinafter "NTCJ") announced on January 20 the start of mass production of its high-power ultraviolet semiconductor laser (379 nm, 1.0 W), which delivers ...

Using ultra-fast laser beams, a team from the Irradiated Solids Laboratory has designed an experiment that allows both the creation of nanometric cavities in metal films and their study using several ...

Zurich, Switzerland — Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest ...

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Multiphoton lithography (often called multiphoton 3D lithography) is an additive manufacturing approach for fabricating intricate micro- and nanostructures. It relies on nonlinear optical absorption, ...